Preparation of Antireflection Coatings from Silicon Dioxide on Glass and Quartz by the Sol-Gel Method with Oligoethers

被引：6

作者：

Troitskii, B. B. ^{[1
]}

Mamaev, Yu. A. ^{[2
]}

Babin, A. A.

Lopatin, M. A. ^{[1
]}

Denisova, V. N. ^{[1
]}

Novikova, M. A. ^{[1
]}

Khokhlova, L. V. ^{[1
]}

Lopatina, T. I. ^{[1
]}

机构：

[1] Russian Acad Sci, Razuvaev Inst Organometall Chem, Nizhnii Novgorod 603950, Russia

[2] Russian Acad Sci, Inst Appl Phys, Nizhnii Novgorod 603950, Russia

来源：

GLASS PHYSICS AND CHEMISTRY | 2010年 / 36卷 / 05期

基金：

俄罗斯基础研究基金会;

关键词：

sol-gel process; oligoethers; silicon dioxide; antireflection coating; silicate glass; optical quartz;

D O I：

10.1134/S108765961005010X

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Antireflection coatings with a low refractive index (1.18-1.23) have been prepared on silicate glass and optical quartz from mesoporous silicon dioxide synthesized by the sol-gel method in the presence of oligoethers. The optimum concentration of the oligoester in the sol is equal to 1.5-2.5 wt %. For the single-layer double-sided coating, the maximum transmission is equal to 99.0% for the silicate glass and 99.9% for quartz.

引用

页码：609 / 616

页数：8

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