Synthesis of Nitrogen-Doped Graphene by Plasma-Enhanced Chemical Vapor Deposition

被引:33
|
作者
Terasawa, Tomo-o [1 ]
Saiki, Koichiro [1 ,2 ]
机构
[1] Univ Tokyo, Dept Chem, Kashiwa, Chiba 2778561, Japan
[2] Univ Tokyo, Dept Complex Sci & Engn, Kashiwa, Chiba 2778561, Japan
关键词
GROWTH; FILMS; SPECTROSCOPY; CATALYSTS; GRAPHITE; PT(111); GAS;
D O I
10.1143/JJAP.51.055101
中图分类号
O59 [应用物理学];
学科分类号
摘要
Synthesis of nitrogen-doped graphene on Cu foils by plasma-enhanced chemical vapor deposition (PE-CVD) and the growth mechanism of doped graphene were investigated. Nitrogen atoms are incorporated into the graphene lattice and most of them exist at a graphitic (quaternary) site. Plasma reaction facilitates the doping of nitrogen atoms even at a substrate temperature as high as 950 degrees C. Doped nitrogen atoms seem to distort the graphene lattice, which causes island-like growth rather than a layer-by-layer growth. (C) 2012 The Japan Society of Applied Physics
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页数:4
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