Photodissociation dynamics of fulvenallene and the fulvenallenyl radical at 248 and 193 nm (vol 19, pg 29305, 2017)

被引：1

|

作者：

Ramphal, Isaac A. ^{[1
,2
]}

Shapero, Mark ^{[1
,2
]}

Haibach-Morris, Courtney ^{[1
]}

Neumark, Daniel M. ^{[1
,2
]}

机构：

[1] Lawrence Berkeley Natl Lab, Div Chem Sci, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA

来源：

PHYSICAL CHEMISTRY CHEMICAL PHYSICS | 2017年 / 19卷 / 44期

关键词：

D O I：

10.1039/c7cp90250f

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：30277 / 30277

页数：1

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