Installation for vacuum-arc film deposition by filtered plasma fluxes

被引：0
|
作者：
Khoroshikh, VM [1 ]
Leonov, SA [1 ]
Belous, VA [1 ]
机构：
[1] Natl Sci Ctr, Kharkov Phys & Technol Inst, UA-310108 Kharkov, Ukraine
来源：
ISDEIV: XIXTH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, VOLS 1 AND 2, PROCEEDINGS | 2000年 / 19卷
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The installation for vacuum-are droplet-free film deposition was designed. It contains two rectilinear plasma sources, in which cylindrical anodes the disk filtering shields are placed. The investigated variant of installation provides ion current at a level 2,4 A at a current of the are in each of plasma sources 100 A. The deposition rate of 5 mum / h for titanium nitride films was achieved over the rotating cylindrical detail of height 50 mm and diameter of 45 mm. Is shown also, that the installation allows to receive coatings by thickness up to 3 microns at the average size of microroughnesses on its surface about 0,08-0,09 microns.
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页码：563 / 566
页数：4
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