Phosphate Oxidation on Boron Doped Diamond Electrode

被引：0

作者：

Hliwa, L. ^{[1
]}

Azzi, M. ^{[1
]}

Bennani, A. ^{[1
]}

Saib, N. ^{[1
]}

Maximovitch, S. ^{[2
]}

Dalard, F. ^{[2
]}

机构：

[1] Fac Sci Ain Chock, Lab Interface Mat Environm, Equipe Electrochim & Chim Environm, Casablanca, Morocco

[2] ENSEEG, INPG, Lab Electrochim & Phys Chim Mat & Interfaces, CNRS,UMR 5631, F-38402 St Martin Dheres, France

来源：

JOURNAL OF NEW MATERIALS FOR ELECTROCHEMICAL SYSTEMS | 2010年 / 13卷 / 02期

关键词：

BDD; phosphate oxidation; peroxodiphosphate; voltametric study; electrolysis; EIS measurements; KINETICS;

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The electrochemical study shows that phosphate ions oxidation on BDD (Boron Doped Diamond) occurs before oxygen evolution in aqueous mild. The reaction rate is enhanced in a basic solution. With voltametric studies it is shown that oxidation current is linearly dependent on phosphate ions concentration and potential scan rate. The electro-chemical mechanism is very complex and involves several steps with adsorbed species and radicals. The electrolysis at fixed potential leads to peroxodiphosphate species formation in solution. The complexity of electrochemical mechanism is confirmed by EIS study. EIS measurements demonstrate also that BDD electrode-electrolyte behavior is compatible to p-type semiconductor with 1.49 Vas plate band potential.

引用

页码：141 / 146

页数：6

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