Characterization of Nanographite Films by Specular Gloss Measurements

被引:1
|
作者
Kaplas, Tommi [1 ]
Ismagilov, Rinat [1 ]
Obraztsov, Alexander [1 ,2 ]
Svirko, Yuri [1 ]
机构
[1] Univ Eastern Finland, Dept Math & Phys, Joensuu 80101, Finland
[2] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119992, Russia
基金
芬兰科学院;
关键词
Multilayer Graphene; Nanographite; CVD; Specular Gloss; CHEMICAL-VAPOR-DEPOSITION; FEW-LAYER GRAPHENE; LARGE-AREA; GRAPHITE; QUALITY; PLASMA;
D O I
10.1166/jno.2012.1216
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Here we propose and demonstrate a specular gloss-based method to estimate a thickness of nanographite films. The proposed method is used to measure a thicknesses of multilayered graphene material produced by two different chemical vapor deposition processes (CVD). Since the presented technique is non-contact and non-destructive it opens an interesting prospect for the fast assessment of ultrathin nanographite films. The obtained results indicated that the measurement technique can be used to define a thickness of graphite films in accuracy of 3 or 4 graphene layers. Moreover the proposed technique allows us to observe a qualitative difference between plasma-enhanced CVD and thermal CVD.
引用
收藏
页码:54 / 59
页数:6
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