Optical characterization of indium-tin-oxynitride fabricated by RF-sputtering

被引：11

作者：

Aperathitis, E

Modreanu, M

Bender, M

Cimalla, V

Ecke, G

Androulidaki, M

Pelekanos, N

机构：

[1] Fdn Res & Technol Hellas, Microelect Res Grp, Inst Elect Struct & Laser, Iraklion, Crete, Greece

[2] Natl Univ Ireland Univ Coll Cork, Natl Microelect Res Ctr, Photon Grp, Cork, Ireland

[3] Appl Films GMBH & Co KG, D-63755 Alzenau, Germany

[4] Tech Univ Ilmenau, Ctr Micro & Nanotechnol, ZMN, D-98684 Ilmenau, Germany

来源：

THIN SOLID FILMS | 2004年 / 450卷 / 01期

关键词：

indium tin oxide; nitrides; sputtering; optical properties; structural properties; conductivity;

D O I：

10.1016/j.tsf.2003.10.046

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Indium-tin-oxynitride (ITON) and indium-tin-oxide (ITO) thin films have been fabricated by r.f. sputtering from an indium-tin-oxide target in a plasma containing N-2 and Ar gases, respectively. The properties of films grown at two different plasma pressures were examined just after deposition and after annealing. Although the electrical properties of these films were improved after annealing, the properties of the ITON films were still inferior to those of the ITO films. The resistivity of the ITON films after annealing was reduced by a factor of two for the film at the higher plasma pressure, but the carrier concentration was almost the same. The ITON films fabricated at low pressure exhibited a significant blue shift in transmittance, which was not related to the increase carrier concentration after annealing. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：101 / 104

页数：4

共 50 条

[31] An extreme change in structural and optical properties of indium oxynitride deposited by reactive gas-timing RF magnetron sputtering
Sungthong, A.
Porntheeraphat, S.
Poyai, A.
Nukeaw, J.
APPLIED SURFACE SCIENCE, 2008, 254 (23) : 7950 - 7954
[32] Optical Properties of Zinc Nitride Thin Films Deposited by RF-Sputtering
Outzourhit, Abdelkader
Abouelaoualim, Abdelmajid
El Amri, Rafiq
Essafti, Abdelhadi
Aboudihab, Ismail
Oueriagli, Amane
2008 2ND ICTON MEDITERRANEAN WINTER (ICTON-MW), 2008, : 127 - 127
[33] Oxygen content of indium tin oxide films fabricated by reactive sputtering
Honda, Shinichi
Tsujimoto, Akira
Watamori, Michio
Oura, Kenjiro
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1995, 13 (3 pt 1):
[34] TIN-DOPED IN2O3 FILMS DEPOSITED BY RF-SPUTTERING
FUJINAKA, M
BEREZIN, AA
THIN SOLID FILMS, 1983, 101 (01) : 7 - 10
[35] Surface and optical properties of indium tin oxide layer deposition by RF magnetron sputtering in argon atmosphere
Yudar, H. Hakan
Korkmaz, Sadan
Ozen, Soner
Senay, Volkan
Pat, Suat
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2016, 122 (08):
[36] Surface and optical properties of indium tin oxide layer deposition by RF magnetron sputtering in argon atmosphere
H. Hakan Yudar
Şadan Korkmaz
Soner Özen
Volkan Şenay
Suat Pat
Applied Physics A, 2016, 122
[37] Corrosion characteristics of TiN and ZrN coated Ti-Ab alloy by RF-sputtering
Park, J. J.
Choe, H. C.
Ko, Y. M.
THERMEC 2006, PTS 1-5, 2007, 539-543 : 1270 - +
[38] Influence of RF Magnetron Sputtering Pressure on the Structural, Optical, and Morphological Properties of Indium Tin Oxide Nanocolumns
Najwa, S.
Shuhaimi, A.
Ameera, N.
Hakim, K. M.
Sobri, M.
Mazwan, M.
Mamat, M. H.
Musa, M. Z.
Rusop, M.
NANOSCIENCE, NANOTECHNOLOGY AND NANOENGINEERING, 2014, 832 : 276 - +
[39] Effect of Substrates Temperature on Structural and Optical Properties Indium Tin Oxide prepared by RF Magnetron Sputtering
Nasir, Mohammad Farid Bin Mohd
Mamat, Mohamad Hafiz
PROCEEDINGS OF THE 14TH IEEE STUDENT CONFERENCE ON RESEARCH AND DEVELOPMENT (SCORED), 2016,
[40] MECHANICAL-PROPERTIES OF TIN FILMS DEPOSITED BY CHANGED-PRESSURE RF-SPUTTERING
KUBO, Y
HASHIMOTO, M
SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3): : 342 - 347

← 1 2 3 4 5 →