Conformations of trimethoxymethylsilane: Matrix isolation infrared and ab initio studies

被引:14
|
作者
Kavitha, V [1 ]
Sundararajan, K [1 ]
Viswanathan, KS [1 ]
机构
[1] Indira Gandhi Ctr Atom Res, Mat Chem Div, Kalpakkam 603102, Tamil Nadu, India
来源
JOURNAL OF PHYSICAL CHEMISTRY A | 2005年 / 109卷 / 41期
关键词
D O I
10.1021/jp0520594
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Conformations of trimethoxymethylsilane were studied using matrix isolation infrared spectroscopy and ab initio computations. Trimethoxymethylsilane was trapped in both argon and nitrogen matrixes using heated nozzle effusive sources and a supersonic jet source, in an effort to alter the conformational population in the matrix. Ab initio calculations were carried out at the HF and B3LYP level using 6-31++G** basis set to support our experimental observations. The frequencies computed at the B3LYP level was found to fit well with our experimental data. A conformer with a C-1(g(+/-)g(+/-)t) structure was predicted by our computations to be the ground state conformer.
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页码:9259 / 9264
页数:6
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