Three-degree-of-freedom optic mount for extreme ultraviolet lithography

被引：0
|
作者：
Tajbakhsh, H [1 ]
Hale, L [1 ]
Malsbury, T [1 ]
Jensen, S [1 ]
Parker, J [1 ]
机构：
[1] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
来源：
PROCEEDINGS OF THE THIRTEENTH ANNUAL MEETING OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING | 1998年
关键词：
precision stage; flexure; kinematic design; parallel link manipulator; error budget; thermal stability; EUVL;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A mechanism to finely align optics for extreme ultraviolet lithography applications is presented. The mechanism is a small motion parallel link manipulator with flexure joints that exhibits nanometer level positioning capability. Performance results of a prototype system are given in this paper.
引用
收藏
页码：359 / 362
页数：4
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