Aerosol-Assisted plasma deposition of nanocomposite thin films

被引：0
|
作者：
Simonnet, C. [1 ,2 ]
Parmar, D. [3 ]
Pozsgay, V. [3 ]
Feron, M. [3 ]
Carnide, G. [4 ]
Kahn, M. L. [4 ]
Stafford, L. [5 ]
Clergereaux, R. [3 ]
机构：
[1] Univ Montreal, Laplace frame Int Master Sci & Technol Plasma, Montreal, PQ H3C 3J7, Canada
[2] Univ Toulouse, Laplace frame Int Master Sci & Technol Plasma, Toulouse, France
[3] Univ Toulouse, Laplace, 118 route Narbonne, F-31062 Toulouse, France
[4] LCC CNRS, 205 Route Narbonne, F-31000 Toulouse, France
[5] Univ Montreal, Dept Phys, Ave Therese Lavoie Roux, Montreal, PQ H2V 0B3, Canada
来源：
2022 IEEE 22ND INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (NANO) | 2022年
关键词：
CARBON LAYER; COATINGS; GROWTH; PECVD; SIZE;
D O I：
10.1109/NANO54668.2022.9928716
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Aerosol injection is an appealing method for plasma thin film deposition. It enables to use liquids as well as dispersions independently on their characteristics. Here, nanocomposite thin films are formed by pulsed injection of a colloidal solution in low-pressure plasma. We discuss the effects of pulsed aerosol injection parameters on the balance of matter.
引用
收藏
页码：413 / 416
页数：4
相关论文
共 50 条
  • [31] Recent Advances in Processing and Applications of Heterobimetallic Oxide Thin Films by Aerosol-assisted Chemical Vapor Deposition
    Ehsan, Muhammad Ali
    Shah, Syed Shaheen
    Basha, Shaik Inayath
    Hakeem, Abbas Saeed
    Aziz, Md Abdul
    CHEMICAL RECORD, 2022, 22 (07):
  • [32] Recent Advancements in the Use of Aerosol-Assisted Atmospheric Pressure Plasma Deposition
    Palumbo, Fabio
    Lo Porto, Chiara
    Fracassi, Francesco
    Favia, Pietro
    COATINGS, 2020, 10 (05)
  • [33] Aerosol-assisted chemical vapour deposition of titanium dioxide thin films on silicon and implementation of a heterojunction diode
    Hussain, Syed Mohd
    Sadullah, Md
    Marwaha, Shikha
    Ghosh, Kunal
    BULLETIN OF MATERIALS SCIENCE, 2023, 46 (03)
  • [34] Aerosol-assisted chemical vapour deposition of titanium dioxide thin films on silicon and implementation of a heterojunction diode
    Syed Mohd Hussain
    Md Sadullah
    Shikha Marwaha
    Kunal Ghosh
    Bulletin of Materials Science, 46
  • [35] Titanium sulfide thin films from the aerosol-assisted chemical vapour deposition of [Ti(SBut)4]
    Carmalt, CJ
    O'Neill, SA
    Parkin, IP
    Peters, ES
    JOURNAL OF MATERIALS CHEMISTRY, 2004, 14 (05) : 830 - 834
  • [36] Enhanced Bactericidal Activity of Silver Thin Films Deposited via Aerosol-Assisted Chemical Vapor Deposition
    Ponja, Sapna D.
    Sehmi, Sandeep K.
    Allan, Elaine
    MacRobert, Alexander J.
    Parkin, Ivan P.
    Carmalt, Claire J.
    ACS APPLIED MATERIALS & INTERFACES, 2015, 7 (51) : 28616 - 28623
  • [37] Hybrid chemical vapour and nanoceramic aerosol assisted deposition for multifunctional nanocomposite thin films
    Warwick, Michael E. A.
    Dunnill, Charles W.
    Goodall, Josie
    Darr, Jawwad A.
    Binions, Russell
    THIN SOLID FILMS, 2011, 519 (18) : 5942 - 5948
  • [38] Aerosol-Assisted CVD of Bismuth Vanadate Thin Films and Their Photoelectrochemical Properties
    Brack, Paul
    Sagu, Jagdeep S.
    Peiris, T. A. Nirmal
    McInnes, Andrew
    Senili, Mauro
    Wijayantha, K. G. Upul
    Marken, Frank
    Selli, Elena
    CHEMICAL VAPOR DEPOSITION, 2015, 21 (1-3) : 41 - 45
  • [39] Aerosol-assisted chemical deposition of nanocomposite material in the "iron-carbon-oxygen" system
    Tyurikova, I
    Alexandrov, S.
    Tyurikov, K.
    Murashkin, S.
    Baron, Y.
    Kosmach, V
    Loshchakov, I
    Pankratov, Y.
    Burdakov, S.
    Mukhametova, L. R.
    EFFICIENT WASTE TREATMENT - 2018, 2019, 337
  • [40] Nb-doped VO2 thin films prepared by aerosol-assisted chemical vapour deposition
    Piccirillo, Clara
    Binions, Russell
    Parkin, Ivan P.
    EUROPEAN JOURNAL OF INORGANIC CHEMISTRY, 2007, (25) : 4050 - 4055
12345