Magnetoresistance of conductive filament in Ni/HfO2/Pt resistive switching memory

被引:13
|
作者
Otsuka, Shintaro [1 ]
Hamada, Yoshifumi [1 ]
Ito, Daisuke [1 ]
Shimizu, Tomohiro [1 ]
Shingubara, Shoso [1 ]
机构
[1] Kansai Univ, Grad Sch Engn, Suita, Osaka 5648680, Japan
基金
日本学术振兴会;
关键词
METAL-OXIDES; DEPENDENCE;
D O I
10.7567/JJAP.54.05ED02
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ferromagnetic conductive filaments (CFs) were formed in a conductive-bridge random access memory (CBRAM) with a Ni electrode using high current compliances during a set process. We investigated CFs in a Ni/HfO2/Pt CBRAM using the current compliance dependences of the set process, low-temperature characteristics, and anisotropic magnetoresistance (AMR). Set processes occurred when a positive bias was applied to the Ni electrode only; therefore, the switching phenomena showed polarity. The resistance of the ON state (low resistance state) was dependent on the current compliance between 2 and 5 mA. The ON state of the device showed a metallic conduction property, suggested by the temperature dependence of resistance. When a high current compliance (5 mA) was used for programming, the ON state showed AMR, which was direct evidence of ferromagnetic CF formation. This suggests that the formation of a ferromagnetic CF is associated with the accumulation of Ni ions that diffused from the Ni electrode. The OFF-state (high resistance state) resistance slightly increased with decreasing temperature and AMR was not observed. (C) 2015 The Japan Society of Applied Physics
引用
收藏
页数:5
相关论文
共 50 条
  • [41] Effects of ZrO2 doping on HfO2 resistive switching memory characteristics
    Ryu, Seung Wook
    Cho, Seongjae
    Park, Joonsuk
    Kwac, Jungsuk
    Kim, Hyeong Joon
    Nishi, Yoshio
    APPLIED PHYSICS LETTERS, 2014, 105 (07)
  • [42] Electroforming Atmospheric Temperature and Annealing Effects on Pt/HfO2/TiO2/HfO2/Pt Resistive Random Access Memory Cell
    A. Napolean
    N. M. Sivamangai
    R. NaveenKumar
    N. Nithya
    Silicon, 2022, 14 : 2863 - 2869
  • [43] Electroforming Atmospheric Temperature and Annealing Effects on Pt/HfO2/TiO2/HfO2/Pt Resistive Random Access Memory Cell
    Napolean, A.
    Sivamangai, N. M.
    NaveenKumar, R.
    Nithya, N.
    SILICON, 2022, 14 (06) : 2863 - 2869
  • [44] Roles and Effects of TiN and Pt Electrodes in Resistive-Switching HfO2 Systems
    Goux, L.
    Wang, X. P.
    Chen, Y. Y.
    Pantisano, L.
    Jossart, N.
    Govoreanu, B.
    Kittl, J. A.
    Jurczak, M.
    Altimime, L.
    Wouters, D. J.
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2011, 14 (06) : H244 - H246
  • [45] Improved resistive switching characteristics of a Pt/HfO2/Pt resistor by controlling anode interface with forming and switching polarity
    Jung, Yong Chan
    Seong, Sejong
    Lee, Taehoon
    Kim, Seon Yong
    Park, In-Sung
    Ahn, Jinho
    APPLIED SURFACE SCIENCE, 2018, 435 : 117 - 121
  • [46] THE INFLUENCE OF TECHNOLOGY AND SWITCHING PARAMETERS ON RESISTIVE SWITCHING BEHAVIOR OF Pt/HfO2/TiN MIM STRUCTURES
    Paskaleva, Albena
    Hudec, Boris
    Jancovic, Peter
    Froehlich, Karol
    Spassov, Dencho
    FACTA UNIVERSITATIS-SERIES ELECTRONICS AND ENERGETICS, 2014, 27 (04) : 621 - 630
  • [47] Grain boundaries as preferential sites for resistive switching in the HfO2 resistive random access memory structures
    Lanza, M.
    Zhang, K.
    Porti, M.
    Nafria, M.
    Shen, Z. Y.
    Liu, L. F.
    Kang, J. F.
    Gilmer, D.
    Bersuker, G.
    APPLIED PHYSICS LETTERS, 2012, 100 (12)
  • [48] Asymmetric Current Behavior on Unipolar Resistive Switching in Pt/HfO2/Pt Resistor With Symmetric Electrodes
    Kang, Jiehun
    Park, In-Sung
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (06) : 2380 - 2383
  • [49] Study of the resistive switching effect in In/HfO2/Ptdevices
    Quinonez, M. F.
    Suarez, L.
    Ordonez, J. E.
    Arango, I. C.
    Gomez, M. E.
    Lopera, W.
    MATERIALS TODAY-PROCEEDINGS, 2019, 14 : 139 - 143
  • [50] Enhanced resistive switching performance for bilayer HfO2/TiO2 resistive random access memory
    Ye, Cong
    Deng, Tengfei
    Zhang, Junchi
    Shen, Liangping
    He, Pin
    Wei, Wei
    Wang, Hao
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2016, 31 (10)