Layer Thickness Impact on Second Harmonic Generation Characterization of SOI Wafers

被引：0
|
作者：
Damianos, D. [1 ]
Ionica, I. [1 ]
Changala, J. [2 ]
Lei, M. [2 ]
Kaminski-Cachopo, A. [1 ]
Blanc-Pelissier, D. [3 ]
Cristoloveanu, S. [1 ]
Vitrant, G. [1 ]
机构：
[1] Univ Grenoble Alpes, Grenoble INP, Minatec, IMEP LAHC, 3 Parvis Louis Neel CS 50257, F-38016 Grenoble, France
[2] FemtoMetrix, 1850 East St Andrew Pl, Santa Ana, CA 92705 USA
[3] INSA Lyon, INL UMR 5270, 7 Ave Jean Capelle, F-69621 Villeurbanne, France
来源：
2017 JOINT INTERNATIONAL EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON (EUROSOI-ULIS 2017) | 2017年
关键词：
Second Harmonic Generation; SOI; nonlinear optics modeling; multilayers; ON-INSULATOR WAFERS; SILICON;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper presents Second Harmonic Generation (SHG) as a non-destructive characterization method for Silicon-On-Insulator (SOI) materials. For thick SOI stacks, the SHG signal is related to the thickness variations of the different layers. However in thin SOI films, the comparison between measurements and optical modeling suggests a supplementary SHG contribution attributed to the electric fields at the SiO2/Si interfaces. As a result of this behavior the SHG technique can be used to evaluate interfacial electric fields and consequently interface charge density in SOI materials.
引用
收藏
页码：184 / 187
页数：4
相关论文
共 50 条
  • [1] Second Harmonic Generation characterization of SOI wafers: Impact of layer thickness and interface electric field
    Damianos, D.
    Vitrant, G.
    Lei, M.
    Changala, J.
    Kaminski-Cachopo, A.
    Blanc-Pelissier, D.
    Cristoloveanu, S.
    Ionica, I.
    SOLID-STATE ELECTRONICS, 2018, 143 : 90 - 96
  • [2] Transient Second Harmonic Generation and correlation with Ψ-MOSFET in SOI wafers
    Damianos, D.
    Ionica, I.
    Kaminski-Cachopo, A.
    Vitrant, G.
    Cristoloveanu, S.
    Pelissier, D. Blanc
    Kryger, M.
    Changala, J.
    2016 JOINT INTERNATIONAL EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON (EUROSOI-ULIS 2016), 2016, : 222 - 225
  • [3] Charge trapping in irradiated SOI wafers measured by second harmonic generation
    Jun, B
    Schrimpf, RD
    Fleetwood, DA
    White, YV
    Pasternak, R
    Rashkeev, SN
    Brunier, F
    Bresson, N
    Fouillat, M
    Cristoloveanu, S
    Tolk, NH
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2004, 51 (06) : 3231 - 3237
  • [4] Experimental evaluation of second harmonic generation for non-invasive contamination detection in SOI wafers
    Alles, Michael L.
    Pasternak, Robert
    Tolk, Norman H.
    Schrimpf, Ronald D.
    Fleetwood, Daniel M.
    Standley, Robert W.
    2006 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, 2006, : 1 - +
  • [5] Second harmonic generation for contactless non-destructive characterization of silicon on insulator wafers
    Damianos, D.
    Pirro, L.
    Soylu, G.
    Ionica, I.
    Nguyen, V.
    Vitrant, G.
    Kaminski, A.
    Blanc-Pelissier, D.
    Onestas, L.
    Changala, J.
    Kryger, M.
    Cristoloveanu, S.
    SOLID-STATE ELECTRONICS, 2016, 115 : 237 - 243
  • [6] Non-Destructive Contamination Detection in Thick and Extremely-Thin SOI Wafers Using Optical Second Harmonic Generation
    Kryger, M. C.
    Changala, J. P.
    Alles, M. L.
    ISTFA 2015: CONFERENCE PROCEEDINGS FROM THE 41ST INTERNATIONAL SYMPOSIUM FOR TESTING AND FAILURE ANALYSIS, 2015, : 282 - 289
  • [7] Characterization of SOI wafers by photoluminescence
    Tajima, M
    Ibuka, S
    SEMICONDUCTOR SILICON 2002, VOLS 1 AND 2, 2002, 2002 (02): : 815 - 828
  • [8] Second harmonic generation for noninvasive metrology of silicon-on-insulator wafers
    Alles, Michael L.
    Pasternak, Robert
    Lu, Xiong
    Tolk, Norman H.
    Schrimpf, Ronald D.
    Fleetwood, Daniel M.
    Dolan, Robert P.
    Standley, Robert W.
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2007, 20 (02) : 107 - 113
  • [9] Spectroscopic second-harmonic generation from silicon-on-insulator wafers
    Pedersen, Kjeld
    Pedersen, Thomas Garm
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2009, 26 (05) : 917 - 922
  • [10] Second-harmonic generation in a layer with variable susceptibility
    Ishkhanyan, A.
    Manukyan, A.
    Joulakian, B.
    LASER PHYSICS, 2008, 18 (07) : 886 - 893
12345