Modification in etching characteristics and surface topography of some electron irradiated polymers

被引：6
|
作者：
Mishra, R
Tripathy, SP
Dwivedi, KK
Khathing, DT
Ghosh, S
Müller, M
Fink, D
机构：
[1] Arunachal Univ, Itanagar 791111, Arunachal Prade, India
[2] Hahn Meitner Inst Kernforsch Berlin GmbH, D-14109 Berlin, Germany
[3] NE Hill Univ, Dept Phys, Shillong 793022, Meghalaya, India
来源：
RADIATION MEASUREMENTS | 2001年 / 34卷 / 1-6期
关键词：
activation energy of etching; bulk etch-rate; atomic force microscopy; surface roughness;
D O I：
10.1016/S1350-4487(01)00128-7
中图分类号：
TL [原子能技术]; O571 [原子核物理学];
学科分类号：
0827 ; 082701 ;
摘要：
Track formation in polymers is a complex phenomenon in which not only primary but also secondary processes, such as formation of radicals and chemical processes, are involved. In the present work, the influence of 2 MeV electrons on the etching properties and the surface topography of polyethylene terephthalate (PET) and polyimide (PI) are studied. The increase in the bulk etch-rate and a decrease in the activation energy of etching were observed for both the polymers. The surface roughness of both polymers was reduced due to electron irradiation. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：95 / 98
页数：4
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