Study of boron nitride films synthesized by ion beam and vapor deposition

被引:0
|
作者
Nishiyama, S [1 ]
Ebe, A [1 ]
Kuratani, N [1 ]
Iwamoto, Y [1 ]
Ogata, K [1 ]
机构
[1] NISSAN ELECT CO LTD,R&D DIV,UKYO KU,KYOTO 6150,JAPAN
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:740 / 743
页数:4
相关论文
共 50 条
  • [41] Growth mechanism of cubic boron nitride thin films by ion beam assist sputter deposition
    Park, KS
    Lee, DY
    Kim, KJ
    Moon, DW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (03): : 1041 - 1047
  • [42] Dielectric constant of boron carbon nitride films synthesized by plasma-assisted chemical-vapor deposition
    Sugino, T
    Etou, Y
    Tai, T
    Mori, H
    APPLIED PHYSICS LETTERS, 2002, 80 (04) : 649 - 651
  • [43] Atomic bonds in boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition
    Kimura, Chiharu
    Sota, Hiroshi
    Aoki, Hidemitsu
    Sugino, Takashi
    DIAMOND AND RELATED MATERIALS, 2009, 18 (2-3) : 478 - 481
  • [44] Electrical and optical characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition
    Yuki, T
    Umeda, S
    Sugino, T
    DIAMOND AND RELATED MATERIALS, 2004, 13 (4-8) : 1130 - 1134
  • [45] Electron emission from nanocrystalline boron nitride films synthesized by plasma-assisted chemical vapor deposition
    Sugino, T
    Tanioka, K
    Kawasaki, S
    Shirafuji, J
    DIAMOND AND RELATED MATERIALS, 1998, 7 (2-5) : 632 - 635
  • [46] Field emission characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition
    Sugino, T
    Hieda, H
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 1233 - 1237
  • [47] Mechanical properties and bonding structure of boron carbon nitride films synthesized by dual ion beam sputtering
    Zhou, Fei
    Wang, Qianzhi
    Yue, Bin
    Wu, Xuemei
    Zhuge, Lanjian
    Cheng, Xiaonong
    MATERIALS CHEMISTRY AND PHYSICS, 2013, 138 (01) : 215 - 224
  • [48] Electrical properties of boron nitride thin films grown by neutralized nitrogen ion assisted vapor deposition
    Lu, M
    Bousetta, A
    Bensaoula, A
    Waters, K
    Schultz, JA
    APPLIED PHYSICS LETTERS, 1996, 68 (05) : 622 - 624
  • [49] Chemical vapor deposition of hexagonal boron nitride films in the reduced pressure
    Choi, BJ
    MATERIALS RESEARCH BULLETIN, 1999, 34 (14-15) : 2215 - 2220
  • [50] Cathodoluminescence of cubic boron nitride films deposited by chemical vapor deposition
    Zhang, WJ
    Kanda, H
    Matsumoto, S
    APPLIED PHYSICS LETTERS, 2002, 81 (18) : 3356 - 3358