Multi-Level Resistive Switching of Pt/HfO2/TaN Memory Device

被引:1
|
作者
Ryu, Hojeong [1 ]
Jung, Hoeje [1 ]
Lee, Kisong [2 ]
Kim, Sungjun [1 ]
机构
[1] Dongguk Univ, Div Elect & Elect Engn, Seoul 04620, South Korea
[2] Dongguk Univ, Dept Informat & Commun Engn, Seoul 04620, South Korea
基金
新加坡国家研究基金会;
关键词
memristor; threshold switching; resistive switching; metal oxides; MECHANISMS; BEHAVIORS;
D O I
10.3390/met11121885
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This work characterizes resistive switching and neuromorphic simulation of Pt/HfO2/TaN stack as an artificial synaptic device. A stable bipolar resistive switching operation is performed by repetitive DC sweep cycles. Furthermore, endurance (DC 100 cycles) and retention (5000 s) are demonstrated for reliable resistive operation. Low-resistance and high-resistance states follow the Ohmic conduction and Poole-Frenkel emission, respectively, which is verified through the fitting process. For practical operation, the set and reset processes are performed through pulses. Further, potentiation and depression are demonstrated for neuromorphic application. Finally, neuromorphic system simulation is performed through a neural network for pattern recognition accuracy of the Fashion Modified National Institute of Standards and Technology dataset.
引用
收藏
页数:8
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