Sub-20 nm nanolithography using templated block copolymers

被引：0
|
作者：
Ross, Caroline A.
Son, Jeong Gon
Gotrik, Kevin W.
Jung, Yeon Sik
Alexander-Katz, Alfredo
Chang, Jae-Byum
Hannon, Adam
Mickiewicz, Rafal
Berggren, Karl K.
Yang, Yoel K. W.
机构：
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2010年 / 240卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
43-PMSE
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页数：1
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