Nanoimprint lithography patterns with a vertically aligned nanoscale tubular carbon structure

被引：16
|
作者：
Kim, Youn-Su
Lee, Kyeongmi
Lee, Jae Suk
Jung, Gun Young [1 ]
Kim, Won Bae
机构：
[1] GIST, Dept Mat Sci & Engn, Kwangju 500712, South Korea
来源：
NANOTECHNOLOGY | 2008年 / 19卷 / 36期
关键词：
D O I：
10.1088/0957-4484/19/36/365305
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A nanoscale tubular carbon structure array was demonstrated as a mold for nanoimprint lithography (NIL), in which a vertically formed and hexagonally aligned nanoscale tubular carbon array was fabricated through carbon growth inside an anodic aluminum oxide (AAO) nanotemplate, followed by controlled chemical etching of the AAO layer. High density (over 10(10) cm(-2)) of the nanoscale carbon pillars with their controlled diameters and protruded lengths was inversely replicated onto a UV-curable resist for the first time using the imprinting lithography technique.
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页数：6
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