Kinetic modelling of epitaxial film growth with up- and downward step barriers

被引:14
|
作者
Leal, F. F. [1 ,2 ]
Oliveira, T. J. [1 ]
Ferreira, S. C. [1 ]
机构
[1] Univ Fed Vicosa, Dept Fis, BR-36571000 Vicosa, MG, Brazil
[2] Inst Fed Ciencia Educ & Tecnol, BR-28300000 Rio De Janeiro, Brazil
来源
JOURNAL OF STATISTICAL MECHANICS-THEORY AND EXPERIMENT | 2011年
关键词
growth instabilities (theory); kinetic roughening (theory); molecular beam epitaxy (theory); thin film deposition (theory); MOLECULAR-BEAM EPITAXY; ENERGY ELECTRON-DIFFRACTION; SLOPE SELECTION; EDGE DIFFUSION; TEMPERATURE; SURFACES; INSTABILITIES; EVOLUTION;
D O I
10.1088/1742-5468/2011/09/P09018
中图分类号
O3 [力学];
学科分类号
08 ; 0801 ;
摘要
The formation of three-dimensional structures during the epitaxial growth of films is associated with the reflection of diffusing particles in descending terraces due to the presence of the so-called Ehrlich-Schwoebel (ES) barrier. We generalize this concept in a solid-on-solid growth model, in which a barrier dependent on the particle coordination (number of lateral bonds) exists whenever the particle performs an interlayer diffusion. The rules do not distinguish explicitly if the particle is executing a descending or an ascending interlayer diffusion. We show that the usual model, with a step barrier in descending steps, produces spurious, columnar and highly unstable morphologies if the growth temperature is varied in a usual range of mound formation experiments. Our model generates well-behaved mounded morphologies for the same ES barriers that produce anomalous morphologies in the standard model. Moreover, mounds are also obtained when the step barrier has an equal value for all particles independently of whether they are free or bonded. Kinetic roughening is observed at long times, when the surface roughness w and the characteristic length xi scale as w similar to t(beta) and xi similar to t(zeta), where beta approximate to 0.31 and zeta approximate to 0.22, independently of the growth temperature.
引用
收藏
页数:15
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