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Drain voltage scaling in carbon nanotube transistors
被引:160
|作者:
Radosavljevic, M
[1
]
Heinze, S
[1
]
Tersoff, J
[1
]
Avouris, P
[1
]
机构:
[1] IBM Corp, Div Res, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词:
D O I:
10.1063/1.1610791
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Decreasing the oxide thickness in carbon nanotube field-effect transistors (CNFETs) improves the turn-on behavior. However, we demonstrate that this also requires scaling the range of the drain voltage. This scaling is needed to avoid an exponential increase in off-current with drain voltage, due to modulation of the Schottky barriers at both the source and drain contact. We illustrate this with results for bottom-gated ambipolar CNFETs with oxides of 2 and 5 nm, and give an explicit scaling rule for the drain voltage. Above the drain voltage limit, the off-current becomes large and has equal electron and hole contributions. This allows the recently reported light emission from appropriately biased CNFETs. (C) 2003 American Institute of Physics.
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页码:2435 / 2437
页数:3
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