Solid state pulsed power systems for plasma immersion ion implantation

被引:0
|
作者
Gaudreau, MPJ [1 ]
Casey, JA [1 ]
Kempkes, MA [1 ]
Mulvaney, JM [1 ]
Hawkey, ATJ [1 ]
机构
[1] Diversified Technol Inc, Bedford, MA 01730 USA
关键词
D O I
暂无
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Diversified Technologies, Inc. (DTI) has developed and patented solid state technology to provide fast, high power switches capable of both opening and closing. These switches are modular, and can be combined in series and/or in parallel to provide a wide range of voltage, current, and power handling capabilities for Plasma Immersion Ion Implantation (PIII).
引用
收藏
页码:496 / 499
页数:4
相关论文
共 50 条
  • [1] Solid state pulsed power systems for plasma source ion implantation
    Gaudreau, MPJ
    Casey, JA
    Kempkes, MA
    Mulvaney, JM
    Hawkey, TJ
    APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2001, 576 : 607 - 610
  • [2] An All Solid-State Pulsed Power Generator for Plasma Immersion Ion Implantation (PⅢ)
    刘克富
    邱剑
    吴异凡
    Plasma Science and Technology, 2009, 11 (02) : 220 - 224
  • [3] An All Solid-State Pulsed Power Generator for Plasma Immersion Ion Implantation (PⅢ)
    刘克富
    邱剑
    吴异凡
    Plasma Science and Technology, 2009, (02) : 220 - 224
  • [4] An All Solid-State Pulsed Power Generator for Plasma Immersion Ion Implantation (PIII)
    Liu Kefu
    Qiu Jian
    Wu Yifan
    PLASMA SCIENCE & TECHNOLOGY, 2009, 11 (02) : 220 - 224
  • [5] Pulsed power modulators for surface treatment by plasma immersion ion implantation
    Rossi, JO
    Ueda, M
    Barroso, JJ
    BRAZILIAN JOURNAL OF PHYSICS, 2004, 34 (4B) : 1565 - 1571
  • [6] Solid-state modulators for plasma immersion ion implantation applications
    Gaudreau, MPJ
    Casey, JA
    Kempkes, MA
    Hawkey, TJ
    Mulvaney, JM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (02): : 888 - 894
  • [7] Direct coupling of pulsed radio frequency and pulsed high power in novel pulsed power system for plasma immersion ion implantation
    Gong, Chunzhi
    Tian, Xiubo
    Yang, Shiqin
    Fu, Ricky K. Y.
    Chu, Paul K.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2008, 79 (04):
  • [8] Plasma immersion ion implantation using pulsed plasma with dc and pulsed high voltages
    Brutscher, J
    Gunzel, R
    Moller, W
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 197 - 202
  • [9] Pulsed plasma production for applications in plasma immersion ion implantation and its implications
    Mukherjee, S.
    Ranjan, M.
    Rane, R.
    Vaghela, N.
    Phukan, A.
    Suraj, K. S.
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (15): : 6502 - 6507
  • [10] Design considerations for plasma immersion ion implantation systems
    Mandl, S
    Brutscher, J
    Gunzel, R
    Moller, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 112 (1-4): : 252 - 254