Approach to in situ characterization of polysilicon surfaces annealed by XeCl excimer laser

被引：0
|
作者：
Nishibe, T
Mitsuhashi, H
Matsuura, Y
Kawakyu, Y
机构：
[1] Mat. and Devices Res. Laboratories, Toshiba Corporation 33, Yokohama 235, Shin-Isogo-cho, Isogo-ku
来源：
APPLIED SURFACE SCIENCE | 1996年 / 99卷 / 01期
关键词：
D O I：
10.1016/0169-4332(95)00336-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
An approach to in situ characterization of polysilicon surfaces annealed by a XeCl excimer laser has been investigated by the UV reflectance method and atomic force microscopy which represents a nano-scale surface morphology. The features of the surface morphology were found to be closely connected to the performance of TFT devices.
引用
收藏
页码：35 / 40
页数：6
相关论文
共 50 条
  • [21] HF CHEMICAL-LASER INITIATED BY AN EXCIMER XECL LASER
    BORISOV, VM
    GORDON, EB
    MATYUSHENKO, VI
    SIZOV, VD
    KHRISTOFOROV, OB
    KVANTOVAYA ELEKTRONIKA, 1982, 9 (02): : 434 - 436
  • [22] Characterization of laser annealed polysilicon by spectroscopic ellipsometry and comparison to other techniques.
    Boher, P
    Stehle, JL
    Suzuki, Y
    Iwasaki, A
    INTERNATIONAL SYMPOSIUM ON POLARIZATION ANALYSIS AND APPLICATIONS TO DEVICE TECHNOLOGY, 1996, 2873 : 294 - 296
  • [23] CHARACTERIZATION OF SURFACES OF LASER-ANNEALED SAMPLES BY ELLIPSOMETRY
    MUSHAKARARA, SC
    VEDAM, K
    SURFACE SCIENCE, 1980, 96 (1-3) : 319 - 328
  • [24] XeCl theoretical model for computer controlled excimer laser
    Pokora, L.
    Ujda, Z.
    OPTICA APPLICATA, 1992, 22 (3-4) : 145 - 154
  • [25] XECL EXCIMER LASER WITH A CONTINUOUSLY TUNABLE OUTPUT PULSEWIDTH
    DILAZZARO, P
    FLORA, F
    GERARDINO, A
    LETARDI, T
    OPTICS COMMUNICATIONS, 1993, 95 (4-6) : 336 - 344
  • [26] FOLDED LONG PULSE XeCl EXCIMER LASER.
    Cao, Hongru
    Chen, Yongrong
    Che, Mingyu
    Hu, Xuejin
    Guangxue Xuebao/Acta Optica Sinica, 1987, 7 (05): : 410 - 414
  • [27] Photoablation and microstructuring of polyestercarbonates and their blends with a XeCl excimer laser
    Kunz, T
    Stebani, J
    Ihlemann, J
    Wokaun, A
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 67 (03): : 347 - 352
  • [28] Photoablation and microstructuring of polyestercarbonates and their blends with a XeCl excimer laser
    Th. Kunz
    J. Stebani
    J. Ihlemann
    A. Wokaun
    Applied Physics A, 1998, 67 : 347 - 352
  • [29] Excimer laser crystallization techniques for polysilicon TFTs
    Fortunato, G
    Mariucci, L
    Carluccio, R
    Pecora, A
    Foglietti, V
    APPLIED SURFACE SCIENCE, 2000, 154 : 95 - 104
  • [30] A SIMPLE COMPACT XECL EXCIMER LASER WITH CORONA PREIONIZATION
    SONG, Q
    CHINESE PHYSICS, 1983, 3 (03): : 705 - 707
12345