Fabrication of Metal Grating by Holographic Lithography System

被引：0

作者：

Zhuang, Yunyi ^{[1
]}

Ye, Zhen ^{[1
]}

Gao, Zhanqi ^{[1
]}

Zhang, Siyuan ^{[1
]}

Hao, Yongqin ^{[1
]}

Feng, Yuan ^{[1
]}

Li, Zaijin ^{[1
]}

Wang, Yong ^{[1
]}

Ma Zhenfu ^{[2
]}

机构：

[1] Changchun Univ Sci & Technol, Changchun 130022, Peoples R China

[2] Baicheng Ordence Test Ctr China, Baicheng 137001, Peoples R China

来源：

2015 INTERNATIONAL CONFERENCE ON OPTOELECTRONICS AND MICROELECTRONICS (ICOM) | 2015年

关键词：

Holographic lithography system; Exposure; Metal grating;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The periodic metal grating is fabricated on SiO2 substrate by holographic lithography and stripping technology. The exposure in holographic lithography is adopted with optimized exposure time of 70s. The metal Al mask is deposited on the substrate by magnetron sputtering system. Images of scanning electron microscopy(SEM) and atomic force microscopy(AFM) show that the metal grating has a period of 528nm, duty cycle of 0.5, thickness of 95nm, with perfect surface morphology, good fringe continuity and uniformity.

引用

页码：341 / 344

页数：4

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