Characterization of Nanoscale Structures using a combination of an Ultra-High Resolution Field Emission SEM and Large Area Silicon Drift Detector

被引：0
|
作者：
Rowlands, N. [1 ]
Erdman, N. [2 ]
Robertson, V. [2 ]
机构：
[1] Oxford Instruments, Concord, MA 01742 USA
[2] USA Inc, JEOL, Peabody, MA 01960 USA
来源：
MICROSCOPY AND MICROANALYSIS | 2009年 / 15卷
关键词：
D O I：
10.1017/S1431927609094264
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：548 / 549
页数：2
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