Carbon nanopillar array deposition on SiO2 by ion irradiation through a porous alumina template

被引：3
|
作者：
Skupinski, M.
Johansson, A.
Jarmar, T.
Razpet, A.
Hjort, K.
Boman, M.
Possnert, G.
Jensen, J.
机构：
[1] Uppsala Univ, Angstrom Lab, S-75121 Uppsala, Sweden
[2] Jozef Stefan Inst, Dept Low & Medium Energy Phys, SI-1000 Ljubljana, Slovenia
来源：
VACUUM | 2007年 / 82卷 / 03期
关键词：
SiO2; carbon nanostructures; carbon pillars; ion lithography; ion irradiation; anodic porous alumina membrane;
D O I：
10.1016/j.vacuum.2007.05.002
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO2/Si substrate. Samples were irradiated by 4 MeV Cl2+ ions with fluences of 10(15)-10(16) ions/cm(2). The combined use of pick'n place positioning of the small porous alumina templates and ion beam irradiation is well suited for post-processing on silicon based integrated circuits. It provides fast local deposition at low temperature of high-density ordered carbon nanopillar arrays in larger silicon based systems, e.g., for field emitting or biosensors applications. (C) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码：359 / 362
页数：4
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