Electrodeposition and performance evaluation of high moment nickel-iron films

被引：0
|
作者：
Ramasubramanian, M [1 ]
Lam, J [1 ]
Hixson-Goldsmith, A [1 ]
Medina, A [1 ]
Dinan, T [1 ]
Robertson, N [1 ]
Harris, T [1 ]
Yuan, S [1 ]
机构：
[1] IBM Corp, Storage Technol Div, San Jose, CA USA
来源：
MAGNETIC MATERIALS, PROCESSES, AND DEVICES VII AND ELECTRODEPOSITION OF ALLOYS, PROCEEDINGS | 2003年 / 2002卷 / 27期
关键词：
D O I：
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
NiFe films were plated in compositions ranging from 55 - 85% Fe using a sulfate-chloride plating bath. The electrical and magnetic properties of these films were studied as a function of iron content. It was determined that films up to magnetic moments of 2.2 T could be obtained with these high iron NiFe alloys. Thin-film heads were made with 1.7 and 2.0 T NiFe materials and tested for magnetic performance. Various experimental parameters were studied for their influence on the film properties.
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页码：298 / 306
页数：9
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