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A snapback-free shorted-anode insulated gate bipolar transistor with an N-path structure
被引:1
|作者:
Chen, Jian
[1
]
Meng, Hang
[1
]
Jiang, Frank X. C.
[1
]
Lin, Xinnan
[1
]
机构:
[1] Peking Univ, Sch Elect & Comp Engn, Key Lab Integrated Microsyst, Shenzhen Grad Sch, Shenzhen 518055, Peoples R China
关键词:
Shorted-anode insulated gate bipolar transistor (SA-IGBT);
Snapback;
Reverse recovery;
Reliability;
REVERSE-CONDUCTING IGBT;
D O I:
10.1016/j.spmi.2014.11.034
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
A snapback-free field stop shorted-anode insulated gate bipolar transistor (SA-IGBT) with an N-path structure is proposed for the first time in this paper. The N-path structure is partially surrounded by the floating P-layer (P-float) and oxide layer in the backside of the wafer, which provides a direct path to the N-collector for electronic current and achieves shorter turn-off time. As demonstrated in numerical simulations, compared with the conventional field stop SA-IGBT, the proposed N-path SA-IGBT is able to completely suppress the snapback effect without causing extra performance fluctuations as long as the doping concentration of the N-path is low enough, while it also has a better reverse conduction ability and a much softer reverse recovery property at the same time without causing any on state loss or turn off speed degradation. (C) 2014 Elsevier Ltd. All rights reserved.
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页码:201 / 209
页数:9
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