Low temperature, aerosol-assisted chemical vapor deposition (AACVD) of CdS, ZnS, and Cd1-xZnxS using monomeric single-source precursors: M(SOCCH3)(2)TMEDA

被引：35

作者：

Nyman, M

HampdenSmith, MJ

Duesler, EN

机构：

[1] Univ of New Mexico, Albuquerque, NM

来源：

CHEMICAL VAPOR DEPOSITION | 1996年 / 2卷 / 05期

关键词：

D O I：

10.1002/cvde.19960020503

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Communication: Novel, monomeric single-source precursors for the CVD of metal sulfides, which are widely used in solar cell technology, are described. The Figure shows the molecular structure of M(SOCCH3)TMEDA, where TMEDA = N,N,N,N-tetramethylethylenediamine, for the Cd and Zn complexes. These compounds allow the lowest deposition temperatures so far reported for highly oriented crystalline, stoichiometric films.

引用

页码：171 / &

页数：5