Influence of High-Energy Proton Irradiation on β-Ga2O3 Nanobelt Field-Effect Transistors

被引:114
|
作者
Yang, Gwangseok [1 ]
Jang, Soohwan [2 ]
Ren, Fan [3 ]
Pearton, Stephen J. [4 ]
Kim, Jihynn [1 ]
机构
[1] Korea Univ, Dept Chem & Biol Engn, Seoul 02841, South Korea
[2] Dankook Univ, Dept Chem Engn, Yongin 16890, South Korea
[3] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[4] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
基金
新加坡国家研究基金会;
关键词
gallium oxide; wide-band gap semiconductors; proton irradiation; two-dimensional materials; thermal annealing; GAN; MOBILITY; DIODES; DAMAGE; SI;
D O I
10.1021/acsami.7b13881
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The robust radiation resistance of wide-band gap materials is advantageous for space applications, where the high-energy particle irradiation deteriorates the performance of electronic devices. We report on the effects of proton irradiation of beta-Ga2O3 nanobelts, whose energy band gap is similar to 4.85 eV at room temperature. Back-gated field-effect transistor (FET) based on exfoliated quasi-two-dimensional beta-Ga2O3 nanobelts were exposed to a 10 MeV proton beam. The proton-dose- and time-dependent characteristics of the radiation-damaged FETs were systematically analyzed. A 73% decrease in the field-effect mobility and a positive shift of the threshold voltage were observed after proton irradiation at a fluence of 2 x 10(15) cm(-2). Greater radiation-induced degradation occurs in the conductive channel of the beta-Ga2O3 nanobelt than at the contact between the metal and beta-Ga2O3. The on/off ratio of the exfoliated beta-Ga2O3 FETs was maintained even after proton doses up to 2 x 10(15) cm(-2). The radiation -induced damage in the beta-Ga2O3-based FETs was significantly recovered after rapid thermal annealing at 500 degrees C. The outstanding radiation durability of beta-Ga2O3 renders it a promising building block for space applications.
引用
收藏
页码:40471 / 40476
页数:6
相关论文
共 50 条
  • [31] Proton Irradiation Effects in MOCVD Grown β-Ga2O3 and ε-Ga2O3 Thin Films
    Yue, Jian-Ying
    Li, Shan
    Qi, Song
    Ji, Xue-Qiang
    Wu, Zhen-Ping
    Li, Pei-Gang
    Tang, Wei-Hua
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2024, 71 (01) : 67 - 71
  • [32] Demonstration of β-Ga2O3 Heterojunction Gate Field-Effect Rectifier
    Liu, Qi
    Zhou, Xuanze
    He, Qiming
    Hao, Weibing
    Zhao, Xiaolong
    Hua, Mengyuan
    Xu, Guangwei
    Long, Shibing
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2023, 70 (07) : 3762 - 3767
  • [33] Electrical contacts in monolayer Ga2O3 field-effect tansistors
    Dong, Linpeng
    Zhou, Shun
    Pu, Kaiwen
    Yang, Chen
    Xin, Bin
    Peng, Bo
    Liu, Weiguo
    APPLIED SURFACE SCIENCE, 2021, 564
  • [34] Oxygen sensitivity of Ga2O3 nanosheet field-effect transistor
    Zhang, Ying-Wu
    Gao, Kuang-Hong
    Li, Zhi-Qing
    APPLIED SURFACE SCIENCE, 2025, 688
  • [35] Fabrication of a Nb-Doped β-Ga2O3 Nanobelt Field-Effect Transistor and Its Low-Temperature Behavior
    Chen, Jin-Xin
    Li, Xiao-Xi
    Tao, Jia-Jia
    Cui, Hui-Yuan
    Huang, Wei
    Ji, Zhi-Gang
    Sai, Qing-Lin
    Xia, Chang-Tai
    Lu, Hong-Liang
    Zhang, David Wei
    ACS APPLIED MATERIALS & INTERFACES, 2020, 12 (07) : 8437 - 8445
  • [36] High-Performance p-NiO/β-Ga2O3 Heterostructure Junction Field-Effect Transistors with Mesa Field Plate Structure
    Luan, Suzhen
    Gu, Wenchong
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2025,
  • [37] Electrothermal Characteristics of Delta-Doped β-Ga2O3 Metal-Semiconductor Field-Effect Transistors
    Kumar, Nitish
    Joishi, Chandan
    Xia, Zhanbo
    Rajan, Sidhharth
    Kumar, Satish
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (12) : 5360 - 5366
  • [38] Controlling the threshold voltage of β-Ga2O3 field-effect transistors via remote fluorine plasma treatment
    Kim, Janghyuk
    Tadjer, Marko J.
    Mastro, Michael A.
    Kim, Jihyun
    JOURNAL OF MATERIALS CHEMISTRY C, 2019, 7 (29) : 8855 - 8860
  • [39] Ga2O3 nanorod-based extended-gate field-effect transistors for pH sensing
    Chiang, Jung-Lung
    Shang, Yi-Guo
    Yadlapalli, Bharath Kumar
    Yu, Fei-Peng
    Wuu, Dong-Sing
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2022, 276
  • [40] Interface Trap-Induced Temperature Dependent Hysteresis and Mobility in β-Ga2O3 Field-Effect Transistors
    Park, Youngseo
    Ma, Jiyeon
    Yoo, Geonwook
    Heo, Junseok
    NANOMATERIALS, 2021, 11 (02) : 1 - 10