Special issue: Photoablation of materials - Preface

被引：0
|
作者：
Masuhara, H
Allen, N
机构：
[1] Osaka Univ, Dept Appl Phys, Fac Engn, Suita, Osaka 5650871, Japan
[2] Manchester Metropolitan Univ, John Dalton Fac Technol, Dept Chem, Manchester M1 5GD, Lancs, England
来源：
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 2001年 / 145卷 / 03期
关键词：
D O I：
10.1016/S1010-6030(01)00592-5
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：143 / 143
页数：1
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