Design and performance of capping layers for extreme-ultraviolet multilayer mirrors

被引：76
|
作者：
Bajt, SA
Chapman, HN
Nguyen, N
Alameda, J
Robinson, JC
Malinowski, M
Gullikson, E
Aquila, A
Tarrio, C
Grantham, S
机构：
[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
[2] Sandia Natl Labs, Livermore, CA 94550 USA
[3] Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
[4] NIST, Gaithersburg, MD 20899 USA
来源：
APPLIED OPTICS | 2003年 / 42卷 / 28期
关键词：
D O I：
10.1364/AO.42.005750
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable for EUVL projection optics and has been tested with accelerated electron-beam and extreme-ultraviolet (ELTV) light in a water-vapor environment. Based on accelerated exposure results, we calculated multilayer lifetimes for all reflective mirrors in a typical commercial EUVL tool and concluded that Ru-capped multilayers have similar to40X longer lifetimes than Si-capped multilayers, which translates to 3 months to many years, depending on the mirror dose. (C) 2003 Optical Society of America.
引用
收藏
页码：5750 / 5758
页数：9
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