Modification of materials surface using plasma enhanced ion beams

被引：0

作者：

Bystritskii, V ^{[1
]}

Garate, E ^{[1
]}

Lavernia, E ^{[1
]}

Pang, X ^{[1
]}

Yankelevich, Y ^{[1
]}

Kharlov, A ^{[1
]}

Grigoriev, V ^{[1
]}

机构：

[1] Univ Calif Irvine, Irvine, CA 92697 USA

来源：

11TH IEEE INTERNATIONAL PULSED POWER CONFERENCE - DIGEST OF TECHNICAL PAPERS, VOLS. 1 & 2 | 1997年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The paper presents experimental results on the application of Microsecond Plasma Opening Switch (MPOS) technology for materials surface modification. The ion beam parameters generated at MPOS are < 250 keV energy, and current and energy densities of 150 A/cm(2) and < 2.2 J/cm(2), respectively. Characterization of the treated samples showed structural changes to a depth of about approximate to 1 micron, Measurements indicate an increase in microhardness of a factor of about 3 for carbon steel samples, Corrosion resistance increase for the treated samples of at least 3, as measured by mass loss, can be attained for aluminum alloys. Microstructural changes in the surface morphology indicate a reduction in grain size for the treated samples and the appearance of shallow craters, EDAX and Anger analysis of irradiated samples with pre-deposited thin films indicate that mixing due to ion beam irradiation occurs to a depth of up to 1 micron.

引用

页码：1054 / 1059

页数：6

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