Post exposure baking temperature effect on resist profile with bottom anti-reflective coating

被引：0
|
作者：
Dai, CM [1 ]
Lin, CL [1 ]
Tai, SC [1 ]
Lamb, JE [1 ]
Iida, M [1 ]
机构：
[1] ITRI,ERSO,SUBMICRON TECHNOL GRP,HSINCHU 310,TAIWAN
来源：
OPTICAL MICROLITHOGRAPHY IX | 1996年 / 2726卷
关键词：
D O I：
10.1117/12.240985
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：598 / 607
页数：10
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