Inductively coupled plasma grown semiconductor films for low cost solar cells with improved light-soaking stability

被引:21
|
作者
Shen, Chang-Hong [1 ]
Shieh, Jia-Min [1 ,2 ,3 ]
Huang, Jung Y. [2 ,3 ]
Kuo, Hao-Chung [2 ,3 ]
Hsu, Chih-Wei [2 ,3 ]
Dai, Bau-Tong [1 ]
Lee, Ching-Ting [4 ,5 ]
Pan, Ci-Ling [2 ,3 ,6 ,7 ]
Yang, Fu-Liang [1 ]
机构
[1] Natl Nano Device Labs, Hsinchu 30078, Taiwan
[2] Natl Chiao Tung Univ, Dept Photon, Hsinchu, Taiwan
[3] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu, Taiwan
[4] Natl Cheng Kung Univ, Inst Microelect, Tainan 701, Taiwan
[5] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 701, Taiwan
[6] Natl Tsing Hua Univ, Dept Phys, Hsinchu 30013, Taiwan
[7] Natl Tsing Hua Univ, Inst Photon Technol, Hsinchu 30013, Taiwan
关键词
MICROCRYSTALLINE SILICON; TRANSISTORS; DEPOSITION;
D O I
10.1063/1.3615650
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigate the performance of a single-junction amorphous Si (a-Si) solar cell fabricated with inductively coupled plasma (ICP) deposition technique. The high-density plasma resulting from high dissociation capacity of ICP enables good-quality hydrogenated Si films to be synthesized at low temperatures. High-density ICP also promotes the diffusion of reactive radicals on substrates and forms a-Si:H films with low defect density (similar to 3 x 10(15) cm(-3)). We demonstrate single-junction a-Si solar cells with a conversion efficiency of 9.6% and improved light-soaking stability. This low thermal-budget thin-film technique could open up the feasibility of efficient thin film solar cells on flexible substrates. (C) 2011 American Institute of Physics. [doi:10.1063/1.3615650]
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页数:3
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