Deposition of Ag nanostructures on TiO2 thin films by RF magnetron sputtering (vol 256, pg 7096, 2010)

被引：0
|
作者：
Zuo, J. [1 ,2 ]
机构：
[1] Xiamen Univ Technol, Dept Mech Engn, Xiamen 361009, Peoples R China
[2] Max Planck Inst Eisenforsch GmbH, D-40237 Dusseldorf, Germany
来源：
APPLIED SURFACE SCIENCE | 2011年 / 257卷 / 06期
关键词：
D O I：
10.1016/j.apsusc.2010.09.032
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：2411 / 2411
页数：1
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