Gate-first process and EOT-scaling of III-V nanowire-based vertical transistors on Si

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作者
Tomioka, Katsuhiro [1 ,1 ]
Fukui, Takashi [1 ]
机构
[1] Hokkaido Univ, GS Informat Sci & Technol, Sapporo, Hokkaido 0608628, Japan
来源
2013 71ST ANNUAL DEVICE RESEARCH CONFERENCE (DRC) | 2013年
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:15 / +
页数:2
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