Iridium/silicon multilayers for extreme ultraviolet applications in the 20-35 nm wavelength range

被引：27

作者：

Zuppella, Paola ^{[1
,2
,3
]}

Monaco, Gianni ^{[1
,2
,3
]}

Corso, Alain Jody ^{[1
,2
]}

Nicolosi, Piergiorgio ^{[1
,2
,3
]}

Windt, David L. ^{[4
]}

Bello, Valentina ^{[5
]}

Mattei, Giovanni ^{[5
]}

Pelizzo, Maria Guglielmina ^{[1
,2
,3
]}

机构：

[1] CNR, Inst Photon, I-35131 Padua, Italy

[2] Nanotechnol Lab Ultraviolet & X Ray Opt Res, I-35131 Padua, Italy

[3] Univ Padua, Dept Informat Engn, I-35131 Padua, Italy

[4] Reflect X Ray Opt LLC, New York, NY 10027 USA

[5] Univ Padua, Dept Phys, I-35131 Padua, Italy

来源：

OPTICS LETTERS | 2011年 / 36卷 / 07期

关键词：

SOFT-X-RAY; CAPPING LAYER; REFLECTIVITY; PERFORMANCE;

D O I：

10.1364/OL.36.001203

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have developed an Ir/Si multilayer for extreme ultraviolet (EUV) applications. Normal incidence reflectance measurements of a prototype film tuned to 30nm wavelength show superior performance relative to a conventional Mo/Si multilayer structure; we also find good stability over time. Transmission electron microscopy and electron dispersive x-ray spectroscopy have been used to examine the microstructure and interface properties of this system: we find amorphous Si layers and polycrystalline Ir layers, with asymmetric interlayer regions of mixed composition. Potential applications of Ir/Si multilayers include instrumentation for solar physics and laboratory EUV beam manipulation. (C) 2011 Optical Society of America

引用

页码：1203 / 1205

页数：3

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