Monitoring of Low Pressure Plasmas with a Calibrated Probe

被引：0

作者：

Runkel, Jan ^{[1
]}

Schulz, Christian ^{[1
]}

Rolfes, Ilona ^{[1
]}

Oberberg, Moritz ^{[2
]}

Awakowicz, Peter ^{[2
]}

机构：

[1] Ruhr Univ Bochum, Inst Microwave Syst, D-44801 Bochum, Germany

[2] Ruhr Univ Bochum, Inst Elect Engn & Plasma Technol, D-44801 Bochum, Germany

来源：

2016 GERMAN MICROWAVE CONFERENCE (GEMIC) | 2016年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this contribution the use of the planar multipole resonance probe (pMRP) as a monitoring tool for low pressure plasmas is presented. By 3D electromagnetic simulations, the probe's ability to monitor two important plasma parameters is investigated and a full one-port calibration is applied to ensure maximum monitoring precision. Measurements in a double inductively coupled argon plasma confirm the simulation results and prove the suitability of the calibrated pMRP for precise plasma monitoring.

引用

页码：43 / 46

页数：4

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