Development of multilayer coatings and spin-off to XRL applications

被引:1
|
作者
Bijkerk, F [1 ]
机构
[1] FOM, Inst Plasma Phys Rijnhuizen, NL-34309 MN Nieuwegein, Netherlands
来源
JOURNAL DE PHYSIQUE IV | 2001年 / 11卷 / PR2期
关键词
D O I
10.1051/jp4:2001298
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The substantially increased effort on multilayer coating technology, as motivated currently by the application of Mo/Si coatings in Extreme UV lithography, is expected to have a beneficial effect on the technology for multilayer optics in the XUV wavelength range in general. Some examples of new usage of multilayer structures in XRL research are given.
引用
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页码:509 / 510
页数:2
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