Development of multilayer coatings and spin-off to XRL applications

被引：1
|
作者：
Bijkerk, F [1 ]
机构：
[1] FOM, Inst Plasma Phys Rijnhuizen, NL-34309 MN Nieuwegein, Netherlands
来源：
JOURNAL DE PHYSIQUE IV | 2001年 / 11卷 / PR2期
关键词：
D O I：
10.1051/jp4:2001298
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The substantially increased effort on multilayer coating technology, as motivated currently by the application of Mo/Si coatings in Extreme UV lithography, is expected to have a beneficial effect on the technology for multilayer optics in the XUV wavelength range in general. Some examples of new usage of multilayer structures in XRL research are given.
引用
收藏
页码：509 / 510
页数：2
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