Separation of SF6 from Gas Mixtures Using Gas Hydrate Formation

被引:119
|
作者
Cha, Inuk [1 ]
Lee, Seungmin [1 ]
Lee, Ju Dong [2 ]
Lee, Gang-Woo [3 ]
Seo, Yongwon [1 ]
机构
[1] Changwon Natl Univ, Dept Chem Engn, Chang Won 641773, Gyeongnam, South Korea
[2] Korea Inst Ind Technol, Green Technol Ctr, Ulsan 681802, South Korea
[3] Yoo Sung Co LTD, R&D Ctr, Ulsan 689892, South Korea
关键词
FLUE-GAS; CLATHRATE; RECOVERY; CO2; TRANSITION;
D O I
10.1021/es1004818
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
This study aims to examine the thermodynamic feasibility of separating sulfur hexafluonde (SF6), which is widely used in various industrial fields and is one of the most potent greenhouse gases, from gas mixtures using gas hydrate formation. The key process variables of hydrate phase equilibria, pressure composition diagram, formation kinetics, and structure identification of the mixed gas hydrates, were closely investigated to verify the overall concept of this hydrate-based SF6 separation process The three-phase equilibria of hydrate (H), liquid water (L-W), and vapor (V) for the binary SF6 + water mixture and for the ternary N-2 + SF6 water mixtures with various SF6 vapor compositions (10, 30, 50, and 70%) were experimentally measured to determine the stability regions and formation conditions of pure and mixed hydrates The pressure composition diagram at two different temperatures of 276.15 and 281 15 K was obtained to investigate the actual SF6 separation efficiency The vapor phase composition change was monitored during gas hydrate formation to confirm the formation pattern and time needed to reach a state of equilibrium. Furthermore, the structure of the mixed N-2 + SF6 hydrate was confirmed to be structure II via Raman spectroscopy Through close examination of the overall experimental results, it was clearly verified that highly concentrated SF6 can be separated from gas mixtures at mild temperatures and low pressure conditions
引用
收藏
页码:6117 / 6122
页数:6
相关论文
共 50 条
  • [31] Separation of Gas Mixtures by Continuous Gas Hydrate Crystallization
    V. M. Vorotyntsev
    V. M. Malyshev
    P. G. Taraburov
    G. M. Mochalov
    Theoretical Foundations of Chemical Engineering, 2001, 35 : 513 - 515
  • [32] Separation of gas mixtures by continuous gas hydrate crystallization
    Vorotyntsev, V.M.
    Malyshev, V.M.
    Taraburov, P.G.
    Mochalov, G.M.
    Teoreticheskie Osnovy Khimicheskoi Tekhnologii, 2001, 35 (05): : 543 - 546
  • [33] Separation of gas mixtures by the gas hydrate crystallization method
    Vorotyntsev, VM
    Malyshev, VM
    Mochalov, GM
    Taraburov, PG
    THEORETICAL FOUNDATIONS OF CHEMICAL ENGINEERING, 2001, 35 (02) : 119 - 123
  • [34] Separation of Gas Mixtures by the Gas Hydrate Crystallization Method
    V. M. Vorotyntsev
    V. M. Malyshev
    G. M. Mochalov
    P. G. Taraburov
    Theoretical Foundations of Chemical Engineering, 2001, 35 : 119 - 123
  • [35] Separation of gas mixtures by continuous gas hydrate crystallization
    Vorotyntsev, VM
    Malyshev, VM
    Taraburov, PG
    Mochalov, GM
    THEORETICAL FOUNDATIONS OF CHEMICAL ENGINEERING, 2001, 35 (05) : 513 - 515
  • [36] Mobility estimates of SF6 ion in parent SF6 gas
    Korasli, C
    Karsli, V
    GASEOUS DIELECTRICS X, 2004, : 69 - 74
  • [37] Pulsative corona from free spherical conducting particles in SF6/gas mixtures
    Mufti, AH
    Malik, NH
    CONFERENCE RECORD OF THE 1996 IEEE INTERNATIONAL SYMPOSIUM ON ELECTRICAL INSULATION, VOLS 1 AND 2, 1996, : 797 - 800
  • [38] Discharge characteristics of SF6/N2 gas mixtures
    Chen, Q.G.
    Xiao, D.M.
    Qiu, Y.C.
    Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University, 2001, 35 (04): : 338 - 342
  • [39] Effective ionization coefficients in binary gas mixtures of argon and SF6
    Dincer, MS
    Hiziroglu, HR
    2001 ANNUAL REPORT CONFERENCE ON ELECTRICAL INSULATION AND DIELECTRIC PHENOMENA, 2001, : 385 - 387
  • [40] Homogeneity and stability of electrical discharges in gas mixtures based on SF6
    Bychkov, YI
    Gorchakov, SL
    Yastremskii, AG
    QUANTUM ELECTRONICS, 2000, 30 (08) : 733 - 737