Solvent vapor induced dewetting in diblock copolymer thin films

被引：42
|
作者：
Peng, J [1 ]
Xuan, Y [1 ]
Wang, HF [1 ]
Li, BY [1 ]
Han, YC [1 ]
机构：
[1] Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
来源：
POLYMER | 2005年 / 46卷 / 15期
基金：
中国国家自然科学基金;
关键词：
dewetting; diblock copolymers; fractal-like holes;
D O I：
10.1016/j.polymer.2005.05.042
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
The dewetting pattern development of thin film of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer has been studied after 'annealing' in the PMMA block selective solvent vapor. Initially, typical circular dewetted holes are observed. Further annealing, however, results in the formation of fractal-like holes. The heterogeneous stress induced by the residual solvent remaining in the film after spin-coating induces the anisotropy of the polymer mobility during the annealing process, which triggers the fort-nation of the intriguing surface patterns. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码：5767 / 5772
页数：6
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