Organic vapor phase deposition of non-stoichiometric charge transfer salts thin films.

被引：0
|
作者：
Adamovich, V [1 ]
Thompson, ME [1 ]
机构：
[1] Univ So Calif, Dept Chem, Los Angeles, CA 90089 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2001年 / 221卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
335-ORGN
引用
收藏
页码：U160 / U160
页数：1
相关论文
共 50 条
  • [21] Non-stoichiometric transfer of complex oxides by pulsed laser deposition at low fluences
    Dam, B
    Rector, JH
    Johansson, J
    DeGroot, DG
    Griessen, R
    ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS, 1996, 397 : 175 - 180
  • [22] Growth of pentacene thin films by in-line organic vapor phase deposition
    Rolin, Cedric
    Vasseur, Karolien
    Genoe, Jan
    Heremans, Paul
    ORGANIC ELECTRONICS, 2010, 11 (01) : 100 - 108
  • [23] Enhanced electrochromism from non-stoichiometric electrodeposited tungsten oxide thin films
    Chithambararaj, A.
    Nandigana, Pardhasaradhi
    Kumar, M. Kaleesh
    Prakash, A. S.
    Panda, Subhendu K.
    APPLIED SURFACE SCIENCE, 2022, 582
  • [24] Donor-acceptor pair recombination in non-stoichiometric ZnO thin films
    Dietrich, Christof P.
    Lange, Martin
    Benndorf, Gabriele
    von Wenckstern, Holger
    Grundmann, Marius
    SOLID STATE COMMUNICATIONS, 2010, 150 (7-8) : 379 - 382
  • [25] Non-stoichiometric Cu-3.8 Ni phase in electrochemically layered Cu-Ni thin films
    Mani, A
    Mohan, S
    Renganathan, NG
    Athinarayanaswamy, K
    Srinivasan, R
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1996, 15 (12) : 1048 - 1050
  • [26] Non-stoichiometric AlOx Films Prepared by Chemical Vapor Deposition Using Dimethylaluminum Isopropoxide as Single Precursor and Their Non-volatile Memory Characteristics
    Lee, Sun Sook
    Lee, Eun-Seok
    Kim, Seok Hwan
    Lee, Byung Kook
    Jeong, Seok Jong
    Hwang, Jin Ha
    Kim, Chang Gyoun
    Chung, Taek-Mo
    An, Ki-Seok
    BULLETIN OF THE KOREAN CHEMICAL SOCIETY, 2012, 33 (07): : 2207 - 2212
  • [27] Novel precursors for the chemical vapor deposition of Group 13 oxynitride thin films.
    Miller, DO
    Vohs, JK
    Fahlman, BD
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U1517 - U1517
  • [28] Liquid crystal and charge carrier dynamics in photorefractive organic thin films.
    Higgins, DA
    Hall, JE
    Xie, AF
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 : U261 - U261
  • [29] Fast Organic Vapor Phase Deposition of Thin Films in Light-Emitting Diodes
    Qu, Boning
    Ding, Kan
    Sun, Kai
    Hou, Shaocong
    Morris, Steven
    Shtein, Max
    Forrest, Stephen R.
    ACS NANO, 2020, 14 (10) : 14157 - 14163
  • [30] Low-temperature chemical vapor deposition of titanium nitride thin films.
    Amato-Wierda, CC
    Wierda, DA
    Norton, ET
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2000, 219 : U831 - U831
12345