Electrochemical polishing of boron-doped diamond in organic media

被引：24

作者：

Panizza, M ^{[1
]}

Siné, G

Duo, I

Ouattara, L

Comninellis, C

机构：

[1] Univ Genoa, Dipartimento Ingn Chim & Proc, I-16129 Genoa, Italy

[2] Swiss Fed Inst Technol, SB ISP UGEC, CH-1015 Lausanne, Switzerland

[3] Univ Cocody, Chim Phys Lab, Abidjan 22, Cote Ivoire

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2003年 / 6卷 / 12期

关键词：

D O I：

10.1149/1.1619646

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The electropolishing of a boron-doped diamond (BDD) film deposited by chemical vapor deposition has been studied in acetic acid-H2SO4 media. The electropolished surface has been characterized by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and electrochemical measurements. The results have shown that in 1 M H2SO4 no polishing of the surface occurred even after prolonged time; on the contrary, in electrolyte containing 3 M acetic acid in 1 M H2SO4 the morphology changed rapidly. The surface became smoother and the roughness decreased as the typical results of a polishing process. All the non-diamond impurities were also removed by the electropolishing treatment in acetic acid media. (C) 2003 The Electrochemical Society.

引用

页码：D17 / D19

页数：3

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