Self-catalysed InAs1-xSbx nanowires grown directly on bare Si substrates

被引:17
|
作者
Anyebe, E. A. [1 ]
Zhuang, Q. [1 ]
机构
[1] Univ Lancaster, Dept Phys, Lancaster LA1 4YB, England
基金
英国工程与自然科学研究理事会;
关键词
Nanostructures; Semiconductors; Epitaxial growth; INFRARED DETECTORS; INAS NANOWIRES; HIGH-MOBILITY; SB; TRANSISTORS; SILICON;
D O I
10.1016/j.materresbull.2014.09.028
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report the self-catalysed growth of InAs1-xSbx nanowires directly on bare Si substrates. Vertically aligned and non-tapered InAs1-xSbx nanowires were realized via indium-assisted nucleation without using nanowire stems. The compositions of the InAs1-xSbx nanowires were determined by high resolution X-ray diffraction (HRXRD). It is observed that the geometry of the nanowires is modified by the Sb flux resulting in an almost doubling of the lateral dimension and a corresponding suppression in the axial growth of the InAs1-xSbx nanowires. This observation unravels a method to modify the geometry of InAs nanowire and open up a promising route for the direct integration of InAs1-xSbx nanowires with the well-established Si platform. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:572 / 575
页数:4
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