3D Sub-Diffraction Printing by Multicolor Photoinhibition Lithography: From Optics to Chemistry

被引:28
|
作者
He, Minfei [1 ]
Zhang, Zhimin [2 ]
Cao, Chun [2 ]
Zhou, Guozun [1 ]
Kuang, Cuifang [1 ,2 ,3 ,4 ]
Liu, Xu [1 ,2 ,3 ]
机构
[1] Zhejiang Univ, Coll Opt Sci & Engn, State Key Lab Modern Opt Instrumentat, Hangzhou 310027, Zhejiang, Peoples R China
[2] Res Ctr Intelligent Chips & Devices, Zhejiang Lab, Hangzhou 311121, Peoples R China
[3] Shanxi Univ, Collaborat Innovat Ctr Extreme Opt, Taiyuan 030006, Shanxi, Peoples R China
[4] Zhejiang Univ, Ningbo Res Inst, Ningbo 315100, Peoples R China
基金
中国博士后科学基金; 中国国家自然科学基金;
关键词
multicolor lithography; nanofabrication; photoinhibition; sub-diffraction direct laser writing; two-photon polymerization; REFRACTIVE-INDEX MISMATCH; STIMULATED-EMISSION; INTERFERENCE LITHOGRAPHY; 2-PHOTON POLYMERIZATION; AUTOFOCUSING METHOD; LASER LITHOGRAPHY; ADAPTIVE OPTICS; STED MICROSCOPY; PHOTORESISTS; FABRICATION;
D O I
10.1002/lpor.202100229
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Photoinhibition lithography (PIL) is a nanoscale fabrication technique that uses multicolor visible light to enable the printing of arbitrary 3D structures beyond the diffraction limit. Photoinhibition allows the control and confinement of the exposed region for photoinitiation during the photolithographic process, thus improving the resolution of existing lithographic techniques, such as direct laser writing. Because PIL enables super-resolution 3D printing, it has a multitude of applications. In this review, practical applications of PIL in the areas of photonics, data storage, and biotechnology are highlighted; in addition, its unique features are revealed. The theory and recent advances in PIL for sub-diffraction printing and high-throughput fabrication are also discussed. Besides, challenges and tentative solutions are discussed with the hope of providing a preliminary roadmap for technological breakthroughs in PIL to enable developments of resolution and throughput.
引用
收藏
页数:16
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