Sputter deposition of undoped and doped SiO2 films for temperature compensated SAW components

被引：0
|
作者：
Bartzsch, Hagen [1 ]
Hildisch, Jan [1 ]
Taeschner, Kerstin [1 ]
Barth, Stephan [1 ]
Rueckriem, Robert [2 ]
Nestler, Matthias [2 ]
机构：
[1] Fraunhofer FEP, Dresden, Germany
[2] Scia Syst GmbH, Chemnitz, Germany
来源：
2019 IEEE INTERNATIONAL ULTRASONICS SYMPOSIUM (IUS) | 2019年
关键词：
TC-SAW; SiOF; magnetron sputtering; reactive magnetron sputtering;
D O I：
10.1109/ultsym.2019.8925909
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Reactive magnetron sputter deposition is shown to be a suitable method for depositing Fluorine doped silica films for temperature compensated SAW devices.
引用
收藏
页码：731 / 734
页数：4
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