Corrosion of UO2 and ThO2:: A quantum-mechanical investigation

被引:59
|
作者
Skomurski, F. N. [1 ]
Shuller, L. C. [2 ]
Ewing, R. C. [1 ,2 ]
Becker, U. [1 ]
机构
[1] Univ Michigan, Dept Geol Sci, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/j.jnucmat.2007.12.007
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The addition of Th to U-based fuels increases resistance to corrosion due to differences in redox-chemistry and electronic properties between UO2 and ThO2. Quantum-mechanical techniques were used to calculate surface energy trends for ThO2, resulting in (111) < (110) < (100). Adsorption energy trends were calculated for water and oxygen on the stable (111) surface Of UO2 and ThO2, and the effect of model set-up on these trends was evaluated. Molecular water is more stable than dissociated water on both binary oxides. Oxidation rates for atomic oxygen interacting with defect-free UO2(111) were calculated to be extremely slow if no water is present, but nearly instantaneous if water is present. The semi-conducting nature Of UO2 is found to enhance the adsorption of oxygen in the presence of water through changes in near-surface electronic structure; the same effect is not observed on the insulating surface of ThO2. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:290 / 310
页数:21
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