Polyimide coatings texture development by ECR-plasma etching

被引：1
|
作者：
Babaevsky, PG [1 ]
Zhukov, AA [1 ]
Zhukova, SA [1 ]
Tchetverov, YS [1 ]
Shapoval, SY [1 ]
机构：
[1] CNII Cyclon, Moscow, Russia
来源：
SIXTH SEMINAR ON PROBLEMS OF THEORETICAL AND APPLIED ELECTRON AND ION OPTICS | 2004年 / 5398卷
关键词：
polyimides; coatings; etching; ECR plasma; texture; profile angle; microelectronics devices;
D O I：
10.1117/12.552179
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Effect of chemical composition and imidization temperature of thin polyimide coatings on etching rate in oxygen) and time of the plasma generated by electron cyclotron resonance source at different bias voltage potential (ion energy process was studied. A correlation of plasmochemical etching rate and topology pattern profile of the polyimide coatings at different etching conditions was determined.
引用
收藏
页码：166 / 170
页数：5
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