Removal of carbon contamination in ETEM by introducing Ar during electron beam irradiation

被引:5
|
作者
Tokunaga, T. [1 ]
Saito, K. [2 ]
Kuno, K. [1 ]
Higuchi, K. [3 ]
Yamamoto, Y. [3 ]
Yamamoto, T. [1 ]
机构
[1] Nagoya Univ, Dept Quantum Engn, Chikusa Ku, Furo Cho,Bldg 5,Room 318, Nagoya, Aichi 4648603, Japan
[2] Nagoya Univ, Dept Mat Engn, Chikusa Ku, Furo Cho, Nagoya, Aichi, Japan
[3] Nagoya Univ, Inst Mat & Syst Sustainabil, Chikusa Ku, Furo Cho, Nagoya, Aichi, Japan
关键词
Argon; carbon; contamination; ETEM; ionisation;
D O I
10.1111/jmi.12759
中图分类号
TH742 [显微镜];
学科分类号
摘要
Organic materials, including carbon, exist inside the transmission electron microscope (TEM) chamber and are adsorbed onto samples under observation during TEM. When these adsorbed organic materials are irradiated by an electron beam, the adsorbed gas is decomposed. Carbon atoms remain on the sample and bond with each other forming a material with an amorphous structure. Due to the carbon deposition on the observation area of the sample, it is contaminated and the TEM image quality is decreased. Ar was introduced into environmental TEM (ETEM) to purge organic material from the sample chamber to reduce contamination growth. After Ar gas was introduced, the contamination was gradually removed. The contamination removal rate was dependent on the Ar pressure. Moreover, it was clear that Ar was ionised by electron beam irradiation and the Ar ions were produced in the ETEM during electron beam irradiation. It is proposed that the Ar ions removed the carbon contamination.
引用
收藏
页码:46 / 52
页数:7
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