Excitation of high-intensity laser radiation of semiconductor targets by a subnanosecond electron beam

被引:2
|
作者
Yalandin, M. I. [1 ]
Bochkarev, M. B. [1 ]
Shunailov, S. A. [1 ]
Sadykova, A. G. [1 ]
Nasibov, A. S. [2 ]
Bagramov, V. G. [2 ]
Berezhnoi, K. V. [2 ]
Vasil'ev, B. I. [2 ]
机构
[1] Russia Acad Sci, Inst Electrophys, Ural Branch, Ul Amundsena 106, Ekaterinburg 620016, Russia
[2] Russian Acad Sci, Lebedev Phys Inst, Leninskii Pr 53, Moscow 119991, Russia
基金
俄罗斯基础研究基金会;
关键词
GAS DIODE; GENERATORS;
D O I
10.1134/S0020441217050116
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The results of the excitation of DdS semiconductor targets by a subnanosecond electron beam (EB) with an electron energy of 60-230 keV are presented. The maximum intensity of laser radiation from targets for a 1-mm EB diameter exceeded 10(7) W/cm(2) at an efficiency of 10%. Lasing was initiated at the leading edge of the EB current; laser radiation then reproduced the shape of the excitation pulse. At low excitation levels, a single-mode lasing regime with the wavelength lambda = 522 nm was observed. The maximum power of laser radiation (10 MW) was achieved on a multielement CdS semiconductor target. The duration of laser pulses changed in the range of 100-500 ps.
引用
收藏
页码:710 / 715
页数:6
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